摘要:采用硫酸-硫酸铜腐刻试验和双环动电位电化学再活化(DL-EPR)试验研究Incoloy800H合金晶间腐蚀敏感性,分析敏化温度与敏化时间对Incoloy800H合金晶间腐蚀敏感性的影响。分别采用光学显微镜、扫描电子显微镜和X射线能谱对Incoloy800H合金敏化试样的微观结构和DL-EPR测试后的表面形貌、表面元素进行表征。结果表明:随着敏化温度升高和敏化时间延长,Incoloy800H合金的晶间腐蚀敏感性先增大后减小,在750℃敏化处理4 h后Incoloy800H合金的敏化程度最大,再活化率达到71.8%;高温环境下,碳化物在Incoloy800H合金晶界析出形成贫铬区,导致Incoloy800H合金出现晶间腐蚀倾向;当敏化温度和敏化时间超过临界值时,贫铬区发生铬元素的自修复,晶间腐蚀敏感性显著减小。
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