首页 期刊 辐射研究与辐射工艺学报 Influence of UV illumination on track etching process 【正文】

Influence of UV illumination on track etching process

作者:LIUQi; ZHUZhiyong; MaekawaYasunari; YoshidaMasaru; YAOSide ShanghaiInstituteofAppliedPhysics; ChineseAcademyofSciences; Shanghai201800; TakasakiRadiationChemistryResearchEstablishment; JAER1; 1233Watanuki-machi; Takasaki; Gunma370-1292; Japan
uv照明   离子跟踪   化学刻蚀   聚四氟乙烯   辐射化学  

摘要:Track technology depends decisively on the track structure of the material after irradiation. In order to reveal microstructures of the ion-tracks, many techniques have been applied to characterize the track. Conductometric method is wildly used in the area as it can monitor in-situ the pore formation and growth processes that are closely related to structures of the ion track.

注:因版权方要求,不能公开全文,如需全文,请咨询杂志社

学术咨询 免费咨询 杂志订阅